Cliff Wallace is Managing Director of Hong Kong Convention and Exhibition Centre (Management) Ltd. He is also the Chairman of Hong Kong – Shanghai Venue Management (Zhengzhou) Ltd., a Mainland company responsible for the management and operation of the Zhengzhou International Exhibition & Convention Centre in Henan Province, PRC. Additionally, he currently heads a new company, Shenyang New World Expo (Management) Ltd., leading the planning of the new venue which this company will manage and operate in this capital city of Liaoning Province, PRC.

Mr. Wallace is an established and proven veteran with over 40 years in the public assembly facility industry. He has been a Certified Facility Executive (CFE) since 1978 and is known internationally for his management, administrative, operations, public-relations, planning and consulting expertise.

Mr. Wallace is a Past President of UFI, the Global Association of the Exhibition Industry and received UFI’s Gold Award in 2009 for exemplary service and contributions to the global exhibition industry. He is a past Chairman of the World Council for Venue Management and the Asia Pacific Exhibition and Convention Council (APECC). He is a past president of the International Association of Assembly Managers (IAAM). He is the recipient of the IAAM’s most distinguished Charles A. McElravy Award for extraordinary contributions to the IAAM and to the profession of public assembly facility management. He currently serves on the IAAM’s International Steering Committee and the IAAM’s Ambassador to China. He received the IAAM Convention Committee Lifetime Achievement Award in 2009. He is a member and past board member of the Venue Management Association (VMA) consisting of venue executives in the Asia-Pacific. He has served as an instructor at VMA’s Public Venue Management School for twelve (12) years. He currently serves on Hong Kong Government’s Steering Committee on MICE.

He is a past Chairman of the Hong Kong Polytechnic University School of Hotel and Tourism Management Advisory Board.